Optical properties of the InAs/InAlGaAs quantum dots subjected to thermal treatments

被引:7
作者
Jo, Byounggu [1 ,2 ]
Kim, Jaesu [1 ]
Lee, Kwang Jae [1 ]
Kim, Hyunjune [1 ]
Park, Dongwoo [1 ]
Lee, Cheul-Ro [1 ]
Kim, Jin Soo [1 ]
Bae, Sung Bum [2 ]
Han, Won Seok [2 ]
Oh, Dae Kon [2 ]
Leem, Jae-Young [3 ]
Kim, Jong Su [4 ]
Lee, Sang Jun [5 ]
Noh, Sam Kyu [5 ]
机构
[1] Chonbuk Natl Univ, Div Adv Mat Engn, Res Ctr Adv Mat Dev, Jeonju 561756, South Korea
[2] Elect & Telecommun Res Inst, IT Convergence & Components Lab, Taejon 305350, South Korea
[3] Inje Univ, Sch Nano Engn, Gimhae 621749, South Korea
[4] Yeungnam Univ, Dept Phys, Kyongsan 712749, South Korea
[5] Korea Res Inst Stand & Sci, Nano Mat Evaluat Ctr, Taejon 305600, South Korea
关键词
Quantum dot; Post-growth annealing; Inter-diffusion; Optical properties;
D O I
10.1016/j.tsf.2010.03.051
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The inter-diffusion kinetics of group-III elements at the interface between self-assembled InAs quantum dots (QDs) and InAlGaAs barriers were investigated indirectly by post-growth annealing treatments and photoluminescence (PL) spectroscopy. The emission wavelength of the InAs/InAlGaAs QDs subjected to thermal annealing at 550 degrees C was 1444 nm at 10K. which indicated a 57 nm red shift compared to the as-grown sample (1387 nm). The emission wavelength was blue-shifted with further increases in annealing temperature to 650 degrees C. Although there was a blue shift in the emission wavelength at an annealing temperature of 600 and 650 degrees C, the emission peak was still longer than that of the as-grown sample. These results were explained by the difference in inter-diffusion probability between group-III elements at the interface between the InAs QDs and InAlGaAs barrier. (C) 2010 Elsevier BM. All rights reserved.
引用
收藏
页码:6429 / 6431
页数:3
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