Effect of citric acid on photoelectrochemical properties of tungsten trioxide films prepared by the polymeric precursor method

被引：20

作者：

Li, Wenzhang ^{[1
,2
]}

Li, Jie ^{[1
,2
]}

Wang, Xuan ^{[1
,2
]}

Ma, Jun ^{[1
,2
]}

Chen, Qiyuan ^{[1
,2
]}

机构：

[1] Cent S Univ, Coll Chem & Chem Engn, Changsha 410083, Hunan, Peoples R China

[2] Minist Educ, Key Lab Resources Chem Nonferrous Met, Changsha 410083, Hunan, Peoples R China

来源：

APPLIED SURFACE SCIENCE | 2010年 / 256卷 / 23期

基金：

国家高技术研究发展计划(863计划);

关键词：

Citric acid; WO3 thin films; Polymeric precursor method; Photoelectrochemistry; THIN-FILMS; LUMINESCENT PROPERTIES; AQUEOUS-SOLUTIONS; OXIDE FILMS; COMPLEXES; LIGHT; PHOTOCATALYSTS; RATIO; WATER; TIO2;

D O I：

10.1016/j.apsusc.2010.05.030

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Effect of citric acid (CA) on microstructure and photoelectrochemical properties of WO3 films prepared by the polymeric precursor method was investigated. The obtained materials were characterized by means of X-ray diffraction (XRD), field-emission scanning electron microscopy (FESEM), and high-resolution transmission electron microscopy (HRTEM). The results showed that samples prepared with adding different amounts of citric acid had a pure phase of cubic. The addition of citric acid could significantly increase the particle size and change the surface of WO3 films. The photoelectrochemical measurements were performed using a standard three-electrode system cell. The films prepared from mass ratios of CA/PEG (R = 0, 0.2, 0.4, 0.6 and 1) showed 1.0, 1.4, 1.7, 2.1 and 0.9 mA cm(-2) at 1.2 V under illumination with a 500 W xenon lamp (I-0 = 100 mW/cm(2)), respectively. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：7077 / 7082

页数：6

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