Effects of substrate temperature on the structural, morphological, electrical and optical properties of Al and Ga co-doped ZnO thin films grown by DC magnetron sputtering
被引:46
|
作者:
Zhu, Ke
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机构:
Hunan Inst Technol, Dept Math & Phys, Hengyang 421002, Peoples R ChinaHunan Inst Technol, Dept Math & Phys, Hengyang 421002, Peoples R China
Zhu, Ke
[1
]
Yang, Ye
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机构:
Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R ChinaHunan Inst Technol, Dept Math & Phys, Hengyang 421002, Peoples R China
Yang, Ye
[2
]
Song, Weijie
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机构:
Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R ChinaHunan Inst Technol, Dept Math & Phys, Hengyang 421002, Peoples R China
Song, Weijie
[2
]
机构:
[1] Hunan Inst Technol, Dept Math & Phys, Hengyang 421002, Peoples R China
[2] Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
Al and Ga co-doped ZnO;
Thin films;
Sputtering;
Electrical properties;
Substrate temperature;
DEPOSITION TEMPERATURE;
D O I:
10.1016/j.matlet.2015.01.130
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
In this work, Al and Ga co-doped zinc oxide (AGZO) thin films were deposited on glass substrates by DC magnetron sputtering under different substrate temperatures. Evolutions of the structural, morphological, electrical and optical properties of the AGZO thin films as a function of substrate temperature were analyzed. Results showed that the average transmittance in the visible range (400-800 nm) for all the thin films was over 82%, which did not change obviously with the substrate temperature. The average grain size increased from 20.6 nm to 51.4 nm and the RMS surface roughness decreased from 21.1 nm to 4.0 nm with substrate temperatures ranging from 150 degrees C up to 450 T. The carrier concentration, Hall mobility of the thin films increased when the substrate temperature was increased from 150 degrees C to 350 degrees C, and then decreased with a further increase of substrate temperature. The film deposited at 350 degrees C exhibited a lowest resistivity of 3.0 x 10(-4) Omega cm with the highest carrier concentration of 5.0 x 10(20) cm(-3) and Hall mobility of 42 cm(2) V-1 s(-1). (C) 2015 Elsevier B.V. All rights reserved.
机构:
Korea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea
Korea Univ, Div Mat Sci & Engn, Seoul 136701, South KoreaKorea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea
Kim, Y. H.
Lee, K. S.
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Korea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South KoreaKorea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea
Lee, K. S.
Lee, T. S.
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机构:
Korea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South KoreaKorea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea
Lee, T. S.
Cheong, B.
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机构:
Korea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South KoreaKorea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea
Cheong, B.
Seong, T. -Y.
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机构:
Korea Univ, Div Mat Sci & Engn, Seoul 136701, South KoreaKorea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea
Seong, T. -Y.
Kim, W. M.
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Korea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South KoreaKorea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea