Highly oriented NiFe soft magnetic films on Si substrates

被引：20

作者：

Gong, H ^{[1
]}

Rao, M ^{[1
]}

Laughlin, DE ^{[1
]}

Lambeth, DN ^{[1
]}

机构：

[1] Carnegie Mellon Univ, Ctr Data Storage Syst, Pittsburgh, PA 15213 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1999年 / 85卷 / 08期

关键词：

D O I：

10.1063/1.370114

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Highly oriented NiFe thin films have been produced via sputter deposition on HF etched Si substrates. Cu and Ag are used as underlayers to induce the epitaxial growth of NiFe films. The orientation relationships between NiFe, Cu, Ag, and Si have been determined by x-ray diffraction measurements and transmission electron microscopy. Magnetic properties have also been characterized. (C) 1999 American Institute of Physics. [S0021-8979(99)45808-6].

引用

页码：5750 / 5752

页数：3

共 4 条

[1] SINGLE CRYSTAL ANISOTROPY AND MAGNETOSTRICTION CONSTANTS OF SEVERAL FERROMAGNETIC MATERIALS INCLUDING ALLOYS OF NIFE, SIFE, ALFE, CONI, AND COFE [J].

HALL, RC .

JOURNAL OF APPLIED PHYSICS, 1959, 30 (06) :816-819

[2]

Lambeth DN, 1998, MATER RES SOC SYMP P, V517, P181

[3] Growth and structural characterization of highly oriented sputter-deposited (111), (110), and (100) Co/Cu superlattices [J].

Smith, DJ ;

Modak, AR ;

Rabedeau, TA ;

Parkin, SSP .

APPLIED PHYSICS LETTERS, 1997, 71 (11) :1480-1482

[4] Epitaxial Ag templates on Si(001) for bicrystal CoCrTa media [J].

Yang, W ;

Lambeth, DN ;

Tang, L ;

Laughlin, DE .

JOURNAL OF APPLIED PHYSICS, 1997, 81 (08) :4370-4372

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