Ultrafast electronic dynamics during femtosecond laser-induced damage in omnidirectional reflector

被引：2

作者：

Sun, HY ^{[1
]}

Jia, TQ ^{[1
]}

Li, XX ^{[1
]}

Xu, SZ ^{[1
]}

Feng, DH ^{[1
]}

Li, CB ^{[1
]}

Wang, XF ^{[1
]}

Xu, ZZ ^{[1
]}

机构：

[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, State Key Lab High Field Laser Phys, Shanghai 201800, Peoples R China

来源：

ACTA PHYSICA SINICA | 2005年 / 54卷 / 10期

关键词：

ferntosecond laser; onmidirectional reflector; excitation processes; damage mechanisms;

D O I：

10.7498/aps.54.4736

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The onmidirectional reflector SiO2/TiO2 is prepared and its threshold fluences and ablation depths at different pulse durations and fluences is studied. In addition a new pump and probe experiment system is developed. The probe pulse is kept as short as possible, while, the pump pulse is stretched and its duration is much longer than that of the probe pulse. Time-resolved excitation processes and damage mechanisms in onmidirectional reflector SiO2/TiO2 is studied. A coupled dynamic model, not only considering the excitation of the material by the laser, but also the counteraction of this excitation to the laser, is employed to study the damage mechanisms. This model well explains the excitation processes during the damage of omnidirectional reflector.

引用

页码：4736 / 4740

页数：5

共 15 条

[1] LASER-INDUCED BREAKDOWN BY IMPACT IONIZATION IN SIO2 WITH PULSE WIDTHS FROM 7 NS TO 150 FS [J].