On the dielectric properties of dc magnetron TiO2 thin films

被引:104
作者
Stamate, MD [1 ]
机构
[1] Bacau Univ, Dept Phys, Bacau 5500, Romania
关键词
TiO2; magnetron; thin films; dielectric properties;
D O I
10.1016/S0169-4332(03)00624-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
TiO2 magnetron sputtered thin films were used for preparation of metal-oxide-metal (MOM), aluminum-TiO2-aluminum. We have analyzed the electrical polarization and frequency dependent effect for the electric capacitance and dielectric loss for TiO2-based structures. We have found that there is a strong dependence of TiO2 dielectric constant with the electric field intensity and signal frequency. We have found that the dielectric properties have weak dependencies of thickness for amorphous TiO2 thin films. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:317 / 322
页数:6
相关论文
共 22 条
[1]   Dielectric properties of TiO2-films reactively sputtered from Ti in an RF magnetron [J].
Alexandrov, P ;
Koprinarova, J ;
Todorov, D .
VACUUM, 1996, 47 (11) :1333-1336
[2]  
Bhutanese N.S.P., 1997, J MATER CHEM, V7, P2297
[3]   SPECTROELLIPSOMETRIC CHARACTERIZATION OF LANTHANIDE-DOPED TIO2 FILMS OBTAINED VIA THE SOL-GEL TECHNIQUE [J].
GARTNER, M ;
PARLOG, C ;
OSICEANU, P .
THIN SOLID FILMS, 1993, 234 (1-2) :561-565
[4]   OPTICAL AND ELECTRICAL-PROPERTIES OF TITANIUM-DIOXIDE FILMS WITH A HIGH MAGNITUDE DIELECTRIC-CONSTANT GROWN ON P-SI BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION AT LOW-TEMPERATURE [J].
KIM, TW ;
JUNG, M ;
KIM, HJ ;
PARK, TH ;
YOON, YS ;
KANG, WN ;
YOM, SS ;
NA, HK .
APPLIED PHYSICS LETTERS, 1994, 64 (11) :1407-1409
[5]   ANODIC TIO2 THIN-FILMS - PHOTOELECTROCHEMICAL, ELECTROCHEMICAL, AND STRUCTURAL STUDY OF HEAT-TREATED AND RUO2 MODIFIED FILMS [J].
KOZLOWSKI, MR ;
TYLER, PS ;
SMYRL, WH ;
ATANASOSKI, RT .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (02) :442-450
[6]   PREPARATION AND PROPERTIES OF AMORPHOUS TIO2 THIN-FILMS BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION [J].
LEE, WG ;
WOO, SI ;
KIM, JC ;
CHOI, SH ;
OH, KH .
THIN SOLID FILMS, 1994, 237 (1-2) :105-111
[7]   PHOTOCATALYSIS ON TIO2 SURFACES - PRINCIPLES, MECHANISMS, AND SELECTED RESULTS [J].
LINSEBIGLER, AL ;
LU, GQ ;
YATES, JT .
CHEMICAL REVIEWS, 1995, 95 (03) :735-758
[8]   MORPHOLOGY AND STRUCTURE OF TIO2 THIN-LAYERS VS THICKNESS AND SUBSTRATE-TEMPERATURE [J].
LOTTIAUX, M ;
BOULESTEIX, C ;
NIHOUL, G ;
VARNIER, F ;
FLORY, F ;
GALINDO, R ;
PELLETIER, E .
THIN SOLID FILMS, 1989, 170 (01) :107-126
[9]   THE EFFECT OF SUBSTRATE-TEMPERATURE ON THE PROPERTIES OF DC REACTIVE MAGNETRON SPUTTERED TITANIUM-OXIDE FILMS [J].
MENG, LJ ;
ANDRITSCHKY, M ;
DOSSANTOS, MP .
THIN SOLID FILMS, 1993, 223 (02) :242-247
[10]   INP-SIO2 MIS STRUCTURE [J].
MESSICK, L .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (11) :4949-4951