Physical properties of Ga-doped ZnO thin films by spray pyrolysis

被引:137
|
作者
Rao, T. Prasada [1 ]
Kumar, M. C. Santhosh [1 ]
机构
[1] Natl Inst Technol, Adv Mat Lab, Dept Phys, Tiruchirappalli 620015, Tamil Nadu, India
关键词
Spray pyrolysis; ZnO; Optical properties; RMS strain; Photoluminescence; ZINC-OXIDE FILMS; ELECTRICAL-PROPERTIES; OPTICAL-PROPERTIES; GALLIUM; PRESSURE; GROWTH; DC; DEPOSITION;
D O I
10.1016/j.jallcom.2010.07.071
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Gallium doped zinc oxide (GZO) thin films were prepared using the simple, flexible and cost-effective spray pyrolysis technique. The physical properties of the films were studied as a function of increasing gallium dopant concentration from 1 to 9 at.%. The films were characterized by various methods to understand their structural, morphological, optical and electrical properties. The X-ray diffraction analysis revealed that the films were polycrystalline in nature having a hexagonal wurtzite type crystal structure with a preferred grain orientation in the (0 0 2) direction. Scanning electron microscopy (SEM) measurements reveal that the surface morphology of the films changes continuously with a decrease in the grain size due to Ga doping. All the films showed nearly 90% of transparency in the entire visible region. A blue shift of the optical band gap was observed with an increase in Ga doping. Room temperature photoluminescence (PL) measurement of the deposited films indicates incorporation of Ga in ZnO lattice. At 3 at.% Ga doping, the film has lowest resistivity of 6.8 x 10(-3) cm while the carrier concentration is highest. (C) 2010 Elsevier By. All rights reserved.
引用
收藏
页码:788 / 793
页数:6
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