Effect of Annealing in Ar/H2 Environment on Chemical Vapor Deposition-Grown Graphene Transferred With Poly (Methyl Methacrylate)
被引:35
作者:
Choi, Woosuk
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Sejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Choi, Woosuk
[1
,2
]
Seo, Young-Soo
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Sejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Seo, Young-Soo
[1
,2
]
Park, Jun-Young
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机构:
Sejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Park, Jun-Young
[1
,2
]
Kim, K. B.
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Sejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Kim, K. B.
[1
,2
]
Jung, Jongwan
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Sejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Jung, Jongwan
[1
,2
]
Lee, Naesung
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Sejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Lee, Naesung
[1
,2
]
Seo, Yongho
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Sejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Seo, Yongho
[1
,2
]
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Hong, Suklyun
[2
,3
]
机构:
[1] Sejong Univ, Hybrid Mat Ctr, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
[2] Sejong Univ, Graphene Res Inst, Seoul 143747, South Korea
[3] Sejong Univ, Dept Phys, Seoul 143747, South Korea
Poly(methyl methacrylate) (PMMA) is widely used for transferring chemical vapor deposition grown graphene. The residue of PMMA after the transfer degrades the electronic properties of the graphene, and the complete removal of PMMA has been a challenging issue. Annealing in Ar/H-2 gas flow has been commonly adopted to remove the PMMA residue. We studied the effect of annealing on graphene in the wide temperature range of 350-800 degrees C using Ar/H-2 forming gas, systematically. The conductivity was increased at moderate temperatures, but decreased at excessive temperatures higher than 650 degrees C. On the other hand, the PMMA residue was not removed effectively in all temperature ranges, judging from Raman spectroscopy and atomic force microscopy. By analyzing Raman spectroscopic data, chemisorption of PMMA residue on graphene was confirmed.
机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Schedin, F.
;
Geim, A. K.
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机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Geim, A. K.
;
Morozov, S. V.
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机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Morozov, S. V.
;
Hill, E. W.
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机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Hill, E. W.
;
Blake, P.
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机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Blake, P.
;
Katsnelson, M. I.
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机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Katsnelson, M. I.
;
Novoselov, K. S.
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机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
机构:
Sejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Yong, Hyeondeuk
;
Kim, Kiyeol
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机构:
Sejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Kim, Kiyeol
;
Choi, Wooseok
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Sejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Choi, Wooseok
;
Park, Joonkyu
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Sejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Park, Joonkyu
;
Ahmad, Muneer
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Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Ahmad, Muneer
;
Seo, Yongho
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机构:
Sejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Schedin, F.
;
Geim, A. K.
论文数: 0引用数: 0
h-index: 0
机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Geim, A. K.
;
Morozov, S. V.
论文数: 0引用数: 0
h-index: 0
机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Morozov, S. V.
;
Hill, E. W.
论文数: 0引用数: 0
h-index: 0
机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Hill, E. W.
;
Blake, P.
论文数: 0引用数: 0
h-index: 0
机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Blake, P.
;
Katsnelson, M. I.
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机构:Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Katsnelson, M. I.
;
Novoselov, K. S.
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h-index: 0
机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
机构:
Sejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Yong, Hyeondeuk
;
Kim, Kiyeol
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h-index: 0
机构:
Sejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Kim, Kiyeol
;
Choi, Wooseok
论文数: 0引用数: 0
h-index: 0
机构:
Sejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Choi, Wooseok
;
Park, Joonkyu
论文数: 0引用数: 0
h-index: 0
机构:
Sejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Park, Joonkyu
;
Ahmad, Muneer
论文数: 0引用数: 0
h-index: 0
机构:
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Ahmad, Muneer
;
Seo, Yongho
论文数: 0引用数: 0
h-index: 0
机构:
Sejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea
Sejong Univ, Graphene Res Inst, Seoul 143747, South KoreaSejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea