Ion energy distribution measurements in rf and pulsed dc plasma discharges

被引:68
作者
Gahan, D. [1 ]
Daniels, S. [2 ]
Hayden, C. [2 ]
Scullin, P. [1 ]
O'Sullivan, D. [1 ]
Pei, Y. T. [3 ]
Hopkins, M. B. [1 ]
机构
[1] Impedans Ltd, Plasma Res Grp, Dublin 17, Ireland
[2] Dublin City Univ, Natl Ctr Plasma Sci & Technol, Dublin 9, Ireland
[3] Univ Groningen, Dept Appl Phys, Mat Innovat Inst M2i, NL-9747 AG Groningen, Netherlands
基金
爱尔兰科学基金会;
关键词
RADIO-FREQUENCY DISCHARGES; RADIOFREQUENCY DISCHARGES; ELECTRICAL CHARACTERIZATION; GLOW-DISCHARGES; HELICON SOURCE; ELECTRODE; ARGON; SURFACES; DYNAMICS; ANALYZER;
D O I
10.1088/0963-0252/21/2/024004
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A commercial retarding field analyzer is used to measure the time-averaged ion energy distributions of impacting ions at the powered electrode in a 13.56 MHz driven, capacitively coupled, parallel plate discharge operated at low pressure. The study is carried out in argon discharges at 10 mTorr where the sheaths are assumed to be collisionless. The analyzer is mounted flush with the powered electrode surface where the impacting ion and electron energy distributions are measured for a range of discharge powers. A circuit model of the discharge, in combination with analytical solutions for the ion energy distribution in radio-frequency sheaths, is used to calculate other important plasma parameters from the measured energy distributions. Radio-frequency compensated Langmuir probe measurements provide a comparison with the retarding field analyzer data. The time-resolved capability of the retarding field analyzer is also demonstrated in a separate pulsed dc magnetron reactor. The analyzer is mounted on the floating substrate holder and ion energy distributions of the impinging ions on a growing film, with 100 ns time resolution, are measured through a pulse period of applied magnetron power, which are crucial for the control of the microstructure and properties of the deposited films.
引用
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页数:8
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