Carbon nanomechanical resonator fabrication from PMMA by FIB/electron-beam dual-beam lithography

被引：1
作者：
Kometani, Reo [1 ]
Hatakeyama, Taiki [1 ]
Kuroda, Kouhei [1 ]
Warisawa, Shin'ichi [1 ]
Ishihara, Sunao [1 ]
机构：
[1] Univ Tokyo, Grad Sch Engn, Bunkyo Ku, Tokyo 1138656, Japan
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2011年 / 29卷 / 06期
关键词：
curing; diamond-like carbon; electron beam lithography; focused ion beam technology; ion beam lithography; nanoelectromechanical devices; nanofabrication; nanolithography; nanowires; polymers; resonators; DIAMOND-LIKE CARBON; DLC FILMS; IRRADIATION; DISSIPATION; RESIST; RAMAN;
D O I：
10.1116/1.3662083
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
An ultra-thin carbon nanomechanical resonator was fabricated from poly(methyl methacrylate) (PMMA) using focused-ion-beam (FIB) and electron-beam dual-beam lithography. A suspended PMMA structure was cured using an ion-beam modification technique using a 30-kV Ga+ FIB, and carbonized to a diamondlike carbon. In addition, we analyzed the vibrational properties of the cured PMMA nanowire to confirm that it functioned as a resonant structure. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3662083]
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页数：5
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