Microstructure and thermal stability of Ti1-xAlxN coatings deposited by reactive magnetron co-sputtering

被引：19

作者：

Du, Miao ^{[1
]}

Hao, Lei ^{[1
]}

Liu, Xiaopeng ^{[1
]}

Jiang, Lijun ^{[1
]}

Wang, Shumao ^{[1
]}

Lv, Fang ^{[1
]}

Li, Zhinian ^{[1
]}

Mi, Jing ^{[1
]}

机构：

[1] Gen Res Inst Nonferrous Met, Dept Energy Mat & Technol, Beijing 100088, Peoples R China

来源：

PROCEEDING OF THE FOURTH INTERNATIONAL CONFERENCE ON SURFACE AND INTERFACE SCIENCE AND ENGINEERING | 2011年 / 18卷

关键词：

Ti(1-x)Al(x)N coating; magnetron co-sputtering; microstructure; thermal stability; AL-N COATINGS; TANDEM ABSORBER; FILMS; TIALN;

D O I：

10.1016/j.phpro.2011.06.085

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Ti(1-x)Al(x)N (0.25 <= x <= 0.75) coatings were deposited by reactive DC/RF magnetron co-sputtering. The phase structure, microstructure, surface roughness and chemical composition were investigated. The anti-oxidation behavior of coatings at high temperature was also studied. It has been shown that the coatings with high Al content (x >= 0.67) consisted of hexagonal-AlN and cubic-TiAlN phases, while it has cubic-TiAlN phase for the coatings with low Al content (x<0.67). The roughness of surface of coatings was 1.89 similar to 4.80nm and it decreased with increasing the Al content. The thermal-stability of the Ti(1-x)Al(x)N coatings increased with increasing Al content. (C) 2011 Published by Elsevier B.V. Selection and/or peer-review under responsibility of Selection and/or peer-review under responsibility of Lanzhou Institute of Physics, China.

引用

页数：5

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