Microstructure and thermal stability of Ti1-xAlxN coatings deposited by reactive magnetron co-sputtering

被引：19
|
作者：
Du, Miao [1 ]
Hao, Lei [1 ]
Liu, Xiaopeng [1 ]
Jiang, Lijun [1 ]
Wang, Shumao [1 ]
Lv, Fang [1 ]
Li, Zhinian [1 ]
Mi, Jing [1 ]
机构：
[1] Gen Res Inst Nonferrous Met, Dept Energy Mat & Technol, Beijing 100088, Peoples R China
来源：
PROCEEDING OF THE FOURTH INTERNATIONAL CONFERENCE ON SURFACE AND INTERFACE SCIENCE AND ENGINEERING | 2011年 / 18卷
关键词：
Ti(1-x)Al(x)N coating; magnetron co-sputtering; microstructure; thermal stability; AL-N COATINGS; TANDEM ABSORBER; FILMS; TIALN;
D O I：
10.1016/j.phpro.2011.06.085
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Ti(1-x)Al(x)N (0.25 <= x <= 0.75) coatings were deposited by reactive DC/RF magnetron co-sputtering. The phase structure, microstructure, surface roughness and chemical composition were investigated. The anti-oxidation behavior of coatings at high temperature was also studied. It has been shown that the coatings with high Al content (x >= 0.67) consisted of hexagonal-AlN and cubic-TiAlN phases, while it has cubic-TiAlN phase for the coatings with low Al content (x<0.67). The roughness of surface of coatings was 1.89 similar to 4.80nm and it decreased with increasing the Al content. The thermal-stability of the Ti(1-x)Al(x)N coatings increased with increasing Al content. (C) 2011 Published by Elsevier B.V. Selection and/or peer-review under responsibility of Selection and/or peer-review under responsibility of Lanzhou Institute of Physics, China.
引用
收藏
页数：5
相关论文
共 50 条
  • [1] Synthesis and Characterization of Nanocrystalline Ti1-xAlxN by Reactive Magnetron Sputtering
    Jose, Feby
    Ramaseshan, R.
    Dash, S.
    Dasgupta, Arup
    Saroja, S.
    Tyagi, A. K.
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2009, 9 (09) : 5451 - 5454
  • [2] Selection of metal ion irradiation for controlling Ti1-xAlxN alloy growth via hybrid HIPIMS/magnetron co-sputtering
    Greczynski, G.
    Lu, J.
    Johansson, M.
    Jensen, J.
    Petrov, I.
    Greene, J. E.
    Hultman, L.
    VACUUM, 2012, 86 (08) : 1036 - 1040
  • [3] Characterization of microstructure and hardness of pcvd deposited Ti1-xAlxN hard coatings
    Ma, SL
    Xu, J
    Jie, WQ
    Xu, KW
    Veprek-Heijman, MGJ
    Veprek, S
    ACTA METALLURGICA SINICA, 2004, 40 (06) : 669 - 672
  • [4] Influence of deposition parameters on microstructure and mechanical properties of chemical vapor deposited Ti1-xAlxN coatings
    Saringer, Christian
    Tkadletz, Michael
    Thurner, Josef
    Czettl, Christoph
    Schalk, Nina
    INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS, 2023, 113
  • [5] Mechanical, tribological, and electrochemical behavior of Cr1-xAlxN coatings deposited by r.f. reactive magnetron co-sputtering method
    Sanchez, J. E.
    Sanchez, O. M.
    Ipaz, L.
    Aperador, W.
    Caicedo, J. C.
    Amaya, C.
    Hernandez Landaverde, M. A.
    Espinoza Beltran, F.
    Munoz-Saldana, J.
    Zambrano, G.
    APPLIED SURFACE SCIENCE, 2010, 256 (08) : 2380 - 2387
  • [6] XPS, AFM and nanoindentation studies of Ti1-xAlxN films synthesized by reactive unbalanced magnetron sputtering
    Shum, PW
    Zhou, ZF
    Li, KY
    Shen, YG
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2003, 100 (02): : 204 - 213
  • [7] Structural, Mechanical, Tribological, and Electrochemical Behavior of Ti1-xAlxN Coatings Deposited by High-Power Impulse Magnetron Sputtering from a Single Ti/Al Target
    Lahouij, M.
    Jaghar, N.
    Abegunde, O.
    Larhlimi, H.
    Makha, M.
    Alami, J.
    JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE, 2024, : 7230 - 7243
  • [8] Effect of microstructure and phase constitution on mechanical properties of Ti1-xAlxN coatings
    Pemmasani, Sai Pramod
    Valleti, Krishna
    Gundakaram, Ravi C.
    Rajulapati, Koteswararao V.
    Mantripragada, Ramakrishna
    Koppoju, Suresh
    Joshi, Shrikant V.
    APPLIED SURFACE SCIENCE, 2014, 313 : 936 - 946
  • [9] Stereometric analysis of Ti1-xAlxN thin films deposited by direct current/radio frequency magnetron sputtering
    Matos, Robert Saraiva
    da Fonseca Filho, Henrique Duarte
    Das, Abhijeet
    Kumar, Sanjeev
    Chawla, Vipin
    Talu, Stefan
    MICROSCOPY RESEARCH AND TECHNIQUE, 2022, 85 (01) : 296 - 307
  • [10] Investigation on the structure and properties of AlxCr1-xN coatings deposited by reactive magnetron co-sputtering
    Wang, X.
    Wang, L. S.
    Qi, Z. B.
    Yue, G. H.
    Chen, Y. Z.
    Wang, Z. C.
    Peng, D. L.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2010, 502 (01) : 243 - 249
12345