Local structure of Sn/Si(001) surface phases

被引:14
|
作者
Lyman, PF
Bedzyk, MJ
机构
[1] NORTHWESTERN UNIV,DEPT MAT SCI & ENGN,EVANSTON,IL 60208
[2] NORTHWESTERN UNIV,CTR MAT RES,EVANSTON,IL 60208
[3] ARGONNE NATL LAB,DIV MAT SCI,ARGONNE,IL 60439
基金
美国国家科学基金会;
关键词
Auger electron spectroscopy; low-index single crystal surfaces; photon absorption spectroscopy; silicon; surface relaxation and reconstruction; surface structure; morphology; roughness and topography; tin; X-ray scattering diffraction and reflection;
D O I
10.1016/S0039-6028(96)01007-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The surface structures of the (6 x 2), c(8 x 4) and (5 x 1) phases of Sn/Si(001) were studied using the X-ray standing wave technique. Using the (004) and (022) Bragg reflections, we find that the (6 x 2) and c(8 x 4) phases are composed of highly buckled Sn-Sn ad-dimers located 1.58 Angstrom above the bulk-like Si(004) surface atomic plane. The Sn atoms occupy two distinct sites with a vertical separation of 0.68 Angstrom, resulting in a dimer buckling angle of approximately 14 degrees. Occupation of second-layer sites by Sn in the (5 x 1) phase, and even in the high-coverage region of the c(8 x 4) phase, changes the Sn spatial distribution normal to the surface, which we attribute to unbuckling and/or breaking of the dimers in the first layer.
引用
收藏
页码:307 / 315
页数:9
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