Application of a bitmap analysis system to the forefront of DRAM devices development

被引：5

作者：

Hamada, T

Sugimoto, M

机构：

来源：

1997 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP - ASMC 97 PROCEEDINGS: THEME - THE QUEST FOR SEMICONDUCTOR MANUFACTURING EXCELLENCE: LEADING THE CHARGE INTO THE 21ST CENTURY | 1997年

关键词：

D O I：

10.1109/ASMC.1997.630739

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A bitmap analysis system with a shape classification has been developed for use in manufacturing of forefront DRAM devices. This system shortens the time needed to improve the processing conditions according to the results of failure analysis. This system is a part of a total yield enhancement system have already been put to practical use in mass production.

引用

页码：222 / 227

页数：6