Surface Potential Based Model of Ultra-Thin Fully Depleted SOI MOSFET for IC Simulations

被引:0
作者
Rozeau, Olivier
Jaud, Marie-Anne
Poiroux, Thierry
Benosman, Mohamed
机构
来源
2011 IEEE INTERNATIONAL SOI CONFERENCE | 2011年
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页数:22
相关论文
共 50 条
[41]   New threshold voltage shift model due to radiation in fully-depleted SOI MOSFET [J].
Wan, Xin-Heng ;
Zhang, Xing ;
Tan, Jing-Rong ;
Gao, Wen-Yu ;
Huang, Ru ;
Wang, Yang-Yuan .
Tien Tzu Hsueh Pao/Acta Electronica Sinica, 2001, 29 (11) :1519-1521
[42]   Threshold voltage model for a fully depleted SOI-MOSFET with a non-uniform profile [J].
Zhang, Guohe ;
Shao, Zhibiao ;
Zhou, Kai .
Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 2007, 28 (06) :842-847
[43]   Reliability of the doping concentration in an ultra-thin body and buried oxide silicon on insulator (SOI) and comparison with a partially depleted SOI [J].
Chang, Wen-Teng ;
Lai, Chun-Ming ;
Yeh, Wen-Kuan .
MICROELECTRONICS RELIABILITY, 2014, 54 (02) :485-489
[44]   Self-aligned recessed source/drain ultra-thin body SOI MOSFET technology [J].
Zhang, ZK ;
Zhang, SD ;
Chan, M .
ESSDERC 2004: PROCEEDINGS OF THE 34TH EUROPEAN SOLID-STATE DEVICE RESEARCH CONFERENCE, 2004, :301-304
[45]   A Unified Analytical One-Dimensional Surface Potential Model for Partially Depleted (PD) and Fully Depleted (FD) SOI MOSFETs [J].
Pandey, Rahul ;
Dutta, Aloke K. .
JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, 2011, 11 (04) :262-271
[46]   A physically-based C-infinity-continuous fully-depleted SOI MOSFET model for analog applications [J].
Iniguez, B ;
Ferreira, LF ;
Gentinne, B ;
Flandre, D .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1996, 43 (04) :568-575
[47]   Comparison of Methods to Bias Fully Depleted SOI-Based MOSFET Nanoribbon pH Sensors [J].
Chapman, Richard A. ;
Fernandes, Poornika G. ;
Seitz, Oliver ;
Stiegler, Harvey J. ;
Wen, Huang-Chun ;
Chabal, Yves J. ;
Vogel, Eric M. .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2011, 58 (06) :1752-1760
[48]   Effects of heavy-ion strikes on fully depleted SOI MOSFETs with ultra-thin gate oxide and different strain-inducing techniques [J].
Griffoni, Alessio ;
Gerardin, Simone ;
Cester, Andrea ;
Paccagnella, Alessandro ;
Simoen, Eddy ;
Claeys, Cor .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2007, 54 (06) :2257-2263
[49]   Surface Potential and Threshold Voltage Model of Fully Depleted Narrow Channel SOI MOSFET Using Analytical Solution of 3D Poisson's Equation [J].
Mani, Prashant ;
Pandey, Manoj Kumar .
JOURNAL OF NANO- AND ELECTRONIC PHYSICS, 2015, 7 (02)
[50]   SIDEWALL-RELATED NARROW CHANNEL-EFFECT IN MESA-ISOLATED FULLY-DEPLETED ULTRA-THIN SOI NMOS DEVICES [J].
KUO, JB ;
CHEN, YG ;
SU, KW .
IEEE ELECTRON DEVICE LETTERS, 1995, 16 (09) :379-381