VmeCN Based Nanoscale Multilayer PVD Coatings Deposited by the Combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering Technology

被引：10

作者：

Hovsepian, Papken Eh. ^{[1
]}

Ehiasarian, Arutiun P. ^{[1
]}

Deeming, Anthony ^{[2
]}

Schimpf, Christian ^{[3
]}

机构：

[1] Sheffield Hallam Univ, Nanotechnol Ctr PVD Res, Mat & Engn Res Inst, Sheffield S1 1WB, S Yorkshire, England

[2] Hydra Clarkson Int, Sheffield S6 3AH, S Yorkshire, England

[3] Tech Univ Min & Technol, Fac Mat Sci & Mat Technol, Freiberg, Germany

来源：

PLASMA PROCESSES AND POLYMERS | 2007年 / 4卷

关键词：

alloys; aluminium alloys; coatings; dry machining; magnetron sputtering; superlattice structure;

D O I：

10.1002/ppap.200732201

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

TiAlCN/VCN has been deposited by the combined high power impulse magnetron sputtering/unbalanced magnetron sputtering (HIPIMS/UBM) technology using a Hauzer HTC 1000-4 PVD system. V(+) ion flux has been generated by HIPIMS discharge to sputter-clean the substrates prior to the coating deposition. The sputtering was carried out in a mixed CH(4), N(2) and Ar atmosphere. Coatings phase and nanoscale structure were characterised using a variety of surface analysis techniques. In dry milling of Al 7010-T 7651 alloy, a TiAlCN/VCN nanoscale multilayer PVD coating outperformed state-of-the-art diamond-like carbon (DLC, Cr/WC/a-CH) coating by a factor of four. In drilling Al-alloy enforced MMC materials, cemented carbide drills coated with TiAlCN/VCN produced 130 holes compared to one to two holes with uncoated drills.

引用

页码：S897 / S901

页数：5

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