Enhanced sputtering from nanoparticles and thin films:: Size effects

被引：53

作者：

Jarvi, T. T. ^{[1
]}

Pakarinen, J. A. ^{[1
]}

Kuronen, A. ^{[1
]}

Nordlund, K. ^{[1
]}

机构：

[1] Univ Helsinki, Dept Phys, FI-00014 Helsinki, Finland

来源：

EPL | 2008年 / 82卷 / 02期

关键词：

D O I：

10.1209/0295-5075/82/26002

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Sputtering of gold nanoparticles and nanometer-thin films under 25 keV gallium-ion bombardment is shown, using molecular-dynamics simulations, to be significantly enhanced compared to bulk. The highest yield, about three times that of bulk gold, occurs for particles of about 8nm in diameter. For thin films, the maximal yield is obtained for roughly 3 nm thick films. A model based on the work of Sigmund is presented to explain the size-dependence. Copyright (c) EPLA, 2008.

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