Comment on "Schottky diodes with a δ-doped near-surface layer" [J. Appl. Phys. 90, 6205 (2001)]

被引:0
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作者
Shashkin, V [1 ]
Murel, A [1 ]
机构
[1] Russian Acad Sci, Inst Phys Microstruct, Nizhnii Novgorod, Russia
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D O I
10.1063/1.1637722
中图分类号
O59 [应用物理学];
学科分类号
摘要
The influence of planar delta-doping on the effective parameters of Schottky diodes was modeled by J. Osvald [J. Appl. Phys. 90, 6205 (2001)]. In this Comment we emphasize that the proposed analysis based on the drift-diffusion model does not seem to be fully correct for the system in question. Neglect of the tunneling effects in Schottky diode with isotype delta-layer inserted near the metal-semiconductor interface leads to wrong speculations about the effective barrier height and ideality factor. (C) 2004 American Institute of Physics.
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页码:2190 / 2191
页数:2
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