Transparency and electrical properties of meshed metal films

被引：69

作者：

Hautcoeur, J. ^{[1
,2
]}

Castel, X. ^{[1
]}

Colombel, F. ^{[1
]}

Benzerga, R. ^{[1
]}

Himdi, M. ^{[1
]}

Legeay, G. ^{[1
]}

Motta-Cruz, E. ^{[2
]}

机构：

[1] Univ Rennes 1, IETR UMR CNRS 6164, IUT St Brieuc, F-35042 Rennes, France

[2] BOUYGUES Telecom, F-44263 Nantes 2, France

来源：

THIN SOLID FILMS | 2011年 / 519卷 / 11期

关键词：

Optical transparency; Sheet resistance; Gridded metal film; Meshed metal layer; Silver film; Transparent conducting oxide; OPTICAL-PROPERTIES; SILVER; LAYER; MULTILAYER; DEPENDENCE; THICKNESS; OXIDE;

D O I：

10.1016/j.tsf.2011.01.262

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Meshed silver/titanium films, deposited on a 1737 Corning glass substrate by radiofrequency (r.f.) magnetron sputtering and etched by wet process, have been studied. Sputtering parameters have been specifically optimized for thick Ag layer deposition (> 3 mu m) and are discussed. An original excimer laser etching process is used for removing the resist for making the prototypes. Simple sheet resistance and optical transparency computings have been used for the theoretical study. A good agreement is obtained with the experimental results. Transparent and conducting samples have been realized with optical transmittances and sheet resistances ranging from 71% to 81% and from 0.023 Omega/square to 1.03 Omega/square, respectively. Hence we demonstrate the independence between optical transparency and sheet resistance for this material AgGL (Ag Grid Layer). The relevance of the mesh structure has been highlighted by the achievement of samples with high level of transparencies and ultra-low sheet resistances. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：3851 / 3858

页数：8

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