Investigation on the Structure and Properties of TiAlN Coatings Deposited by DC Reactive Magnetron Sputtering

被引：3
|
作者：
Wang, Xuan [1 ]
Zhang, Kui [1 ]
Yue, Guanghui [1 ]
Peng, Dongliang [1 ]
Qi, Zhengbing [2 ]
Wang, Zhoucheng [2 ]
机构：
[1] Xiamen Univ, Coll Mat, Xiamen, Peoples R China
[2] Xiamen Univ, Coll Chem & Chem Engn, Xiamen, Peoples R China
来源：
MATERIALS PROCESSING TECHNOLOGIES, PTS 1 AND 2 | 2011年 / 154-155卷
关键词：
TiAlN; coatings; vapor deposition; microstructure; hardness; FILMS; LAYER;
D O I：
10.4028/www.scientific.net/AMR.154-155.1639
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
TiAIN coatings have been deposited by reactive magnetron sputtering from TiAl alloy target using a direct current (DC) power source. The crystal structure, chemical composition, surface morphology and hardness of TiAIN coatings which were prepared at various N-2 flow rates have been systemically investigated. The results show a strong effect of N-2 flow rates on the orientation, grain size and densification in TiAlN coatings. The TiAlN coating shows the highest hardness at a certain N-2 flow rate when it has the most compact structure.
引用
收藏
页码：1639 / +
页数：2
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