Internal electron emission in metal-insulator-metal thin film tunnel devices bombarded with keV argon and gold-cluster projectiles

被引:5
作者
Marpe, Mario [1 ]
Heuser, Christian [1 ]
Diesing, Detlef [2 ]
Wucher, Andreas [1 ]
机构
[1] Univ Duisburg Essen, Fak Phys, D-47048 Duisburg, Germany
[2] Univ Duisburg Essen, Fak Chem, D-45117 Essen, Germany
关键词
Kinetic excitation; Internal electron emission; Kinetic electron emission; Cluster bombardment; Vicinage effect; EXCITATION; JUNCTIONS;
D O I
10.1016/j.nimb.2010.12.045
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The kinetic excitation of a solid surface under bombardment with energetic ions is studied via internal electron emission in a metal-insulator-metal junction. Particular attention was focused on the dependence of the internal emission yield on the impact angle of the projectile ions, which was measured and compared to corresponding data for external emission. We find the internal and external yields to behave differently, therefore delivering complementary information regarding the depth distribution of the kinetic excitation profile. A first attempt to interpret the internal emission yield in terms of a simple electron emission model is described and shown not to be sufficient to explain the experimentally observed behavior. Besides atomic ions, measurements of the internal emission yield under bombardment with cluster projectiles were performed, which are shown to exhibit a nonlinear yield enhancement similar to that of the sputter yield. This finding constitutes a new case in the observation of "vicinage effects" in cluster-initiated kinetic excitation, which is attributed to the transition from a linear collision cascade to a collisional spike. (c) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:972 / 976
页数:5
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