EFFECTS OF GATE TUNNELING CURRENT ON THE STATIC CHARACTERISTICS OF CMOS CIRCUITS

被引:0
|
作者
Wu, Tiefeng [1 ,2 ]
Zhang, Heming [1 ]
Hu, Huiyong [1 ]
机构
[1] Xidian Univ, Sch Microelect, Xian, Peoples R China
[2] Jiamusi Univ, Sch Informat & Elect Technol, Jiamusi, Peoples R China
来源
INTERNATIONAL JOURNAL OF INNOVATIVE COMPUTING INFORMATION AND CONTROL | 2011年 / 7卷 / 06期
关键词
Device simulation; Gate tunneling current model; Static power consumption; Ultra-thin gate oxide; CURRENT MODEL; DEVICES;
D O I
暂无
中图分类号
TP18 [人工智能理论];
学科分类号
081104 ; 0812 ; 0835 ; 1405 ;
摘要
With the scaling of MOS devices, gate tunneling current increases in exponential with thinner gate oxides, and the static standby power consumption of CMOS circuits is severely affected by the presence of gate tunneling currents. To illustrate the impacts, in this paper, a simpler gate tunneling current theory model by a double integral approach in ultra-thin gate oxide MOS devices that tunneling current changes with gate-oxide thickness is presented. The simulation results well agree with the theory model proposed in BSIM4. The characteristics of current source inverter composed of ultra-thin gate oxide MOS devices are also studied in detail to analyze its behavior and predict the trends of power dissipated with scaled technology nodes in the effects of gate tunneling current.
引用
收藏
页码:3229 / 3237
页数:9
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