Quantum mechanical electron transmission coefficient at interfaces and ballistic electron emission microscopy

被引:3
作者
Menegozzi, R
Reinhard, PG
Schulz, M
机构
[1] Univ Erlangen Nurnberg, Inst Angew Phys, D-91058 Erlangen, Germany
[2] Univ Erlangen Nurnberg, Inst Theoret Phys 2, D-91058 Erlangen, Germany
关键词
ballistic electron emission microscopy; electrical transport; electron-solid interactions; gold; metal-semiconductor interfaces; semi-empirical models and model calculations; silicon;
D O I
10.1016/S0039-6028(98)00395-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We derive the quantum mechanical transmission coefficient for the electron transport across a plane interface of a metal/semiconductor or semiconductor/semiconductor heterostructure. An effective mass model is used for the conduction band in each layer of the system. Non-diagonal mass tensors and indirect band minima are covered by the model. The quantum effects for the electron transmission are investigated for the system Au(111)/Si(111) as a test case. We find sizeable corrections originating from quantum effects. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:L810 / L815
页数:6
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