conduction bands;
deep levels;
energy gap;
gallium compounds;
III-V semiconductors;
MOCVD;
nanostructured materials;
nanotechnology;
photoemission;
photoluminescence;
wide band gap semiconductors;
CURRENT COLLAPSE;
NANOWIRES;
CARBON;
PHOTOCONDUCTIVITY;
HETEROSTRUCTURES;
SEMICONDUCTORS;
TRANSISTORS;
CAPACITANCE;
DEFECTS;
EPITAXY;
D O I:
10.1063/1.3211317
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Deep level defects in GaN nanorods (NRs) grown by metal organic chemical vapor deposition were studied using deep level optical spectroscopy (DLOS) and microphotoluminescence (mu-PL). DLOS determines the absolute optical ionization energy, discerns majority versus minority carrier photoemission, and has sensitivity to nonradiative defect centers. These are important aspects of deep level spectroscopy for NRs that are not obtainable using luminescence techniques alone. Deep level defects were observed via DLOS at E-c-2.81 eV, E-c-1.77 eV, and E-c-3.19 eV, where E-c is the conduction band minimum. The mu-PL spectra revealed a dominant defect band peaked near 2.19 eV. The E-c-2.81 eV band gap state and the 2.19 eV PL peak can be attributed to the same defect center within a one-dimensional configuration-coordinate model. The NR DLOS spectra are compared to reports for thin film GaN, and possible physical origins of the deep level defects are discussed.
机构:
Anhui Univ, Sch Elect Sci & Technol, Hefei 230039, Peoples R ChinaAnhui Univ, Sch Elect Sci & Technol, Hefei 230039, Peoples R China
Wang Ying
Li Su-yun
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机构:
Anhui Univ, Sch Elect Sci & Technol, Hefei 230039, Peoples R China
Anhui Univ, Modern Educ Technol Ctr, Hefei 230039, Peoples R ChinaAnhui Univ, Sch Elect Sci & Technol, Hefei 230039, Peoples R China
Li Su-yun
Yin Zhi-jun
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机构:
Chinese Acad Sci, Inst Solid State Phys, Key Lab Mat Phys, Hefei 230031, Peoples R ChinaAnhui Univ, Sch Elect Sci & Technol, Hefei 230039, Peoples R China
机构:
USA, Res Lab, Sensors & Electron Devices Directorate, AMSRD ARL SE EM, Adelphi, MD 20783 USAUSA, Res Lab, Sensors & Electron Devices Directorate, AMSRD ARL SE EM, Adelphi, MD 20783 USA
Metcalfe, Grace D.
Readinger, Eric D.
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机构:
USA, Res Lab, Sensors & Electron Devices Directorate, AMSRD ARL SE EM, Adelphi, MD 20783 USAUSA, Res Lab, Sensors & Electron Devices Directorate, AMSRD ARL SE EM, Adelphi, MD 20783 USA
Readinger, Eric D.
Shen, Hongen
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USA, Res Lab, Sensors & Electron Devices Directorate, AMSRD ARL SE EM, Adelphi, MD 20783 USAUSA, Res Lab, Sensors & Electron Devices Directorate, AMSRD ARL SE EM, Adelphi, MD 20783 USA
Shen, Hongen
Woodward, Nathaniel T.
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机构:
Lehigh Univ, Dept Phys, Bethlehem, PA 18015 USAUSA, Res Lab, Sensors & Electron Devices Directorate, AMSRD ARL SE EM, Adelphi, MD 20783 USA
Woodward, Nathaniel T.
Dierolf, Volkmar
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机构:
Lehigh Univ, Dept Phys, Bethlehem, PA 18015 USAUSA, Res Lab, Sensors & Electron Devices Directorate, AMSRD ARL SE EM, Adelphi, MD 20783 USA
Dierolf, Volkmar
Wraback, Michael
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USA, Res Lab, Sensors & Electron Devices Directorate, AMSRD ARL SE EM, Adelphi, MD 20783 USAUSA, Res Lab, Sensors & Electron Devices Directorate, AMSRD ARL SE EM, Adelphi, MD 20783 USA
机构:
Univ Pretoria, Phys Dept, ZA-0002 Pretoria, South Africa
Univ Elimam Elmahdi, Fac Educ, Kosti White Nile, SudanUniv Pretoria, Phys Dept, ZA-0002 Pretoria, South Africa
Ali, Abdulraoof I. A.
Danga, Helga T.
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机构:
Univ Pretoria, Phys Dept, ZA-0002 Pretoria, South AfricaUniv Pretoria, Phys Dept, ZA-0002 Pretoria, South Africa
Danga, Helga T.
Nel, Jacqueline M.
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机构:
Univ Pretoria, Phys Dept, ZA-0002 Pretoria, South AfricaUniv Pretoria, Phys Dept, ZA-0002 Pretoria, South Africa
Nel, Jacqueline M.
Meyer, Walter E.
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机构:
Univ Pretoria, Phys Dept, ZA-0002 Pretoria, South AfricaUniv Pretoria, Phys Dept, ZA-0002 Pretoria, South Africa