Noninvasive plasma diagnostics in a parallel-plate reactor for RF discharges

被引：0

作者：

Schwarz, J

机构：

[1] Institut für Plasmaforschung, Universität Stuttgart, D-70569 Stuttgart

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1996年 / 16卷 / 04期

关键词：

plasma diagnostics; RF discharge; plasma reactors; plasma modeling; self-bias; current-voltage characteristics;

D O I：

10.1007/BF01447005

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

Extensive studies on the discharge current of a 50-kHz argon glow discharge in a parallel-plate reactor has led to a model that is able to describe the discharge in a wide range of pressures and powers for the evaluation of plasma parameters. The network simulation program PSPICE can be used to simulate the model in a way easily adapted to other plasma reactors as well. This may lead to a new plasma diagnostic method that does not require a complicated setup. The behavior of the discharge current can also be used for numerical simulations of the self-bias voltage in capacitively coupled plasma reactors. The influence of power and pressure can be integrated and allows an estimation of the self-bias for given reactor geometries and process parameters.

引用

页码：487 / 498

页数：12

共 13 条

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