Nanometer-scale scanning sensors fabricated using stencil lithography

被引：44

作者：

Champagne, AR ^{[1
]}

Couture, AJ ^{[1
]}

Kuemmeth, F ^{[1
]}

Ralph, DC ^{[1
]}

机构：

[1] Cornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USA

来源：

APPLIED PHYSICS LETTERS | 2003年 / 82卷 / 07期

关键词：

D O I：

10.1063/1.1554483

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors. (C) 2003 American Institute of Physics.

引用

页码：1111 / 1113

页数：3

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