Analysis of waveguide structure for surface plasmon polariton interference

被引:0
|
作者
Wang Jing-Quan [1 ]
Liang Hui-Min [2 ]
Fang Liang [3 ]
Li Min [1 ]
Niu Xiao-Yun [1 ]
Du Jing-Lei [1 ]
机构
[1] Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China
[2] Hebei Univ Engn, Coll Sci, Tianjin 056038, Hebei, Peoples R China
[3] Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
基金
中国国家自然科学基金;
关键词
surface plasmon polaritons (SPPs); sub-wavelength interferential lithography; waveguide; Goos-Hanchen shift; LITHOGRAPHY; NANOLITHOGRAPHY;
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
This paper describes a multi-reflected mode based on a narrow waveguide to enlarge the interferential area of surface plasmon polaritons (SPPs). A reasonable thickness of metal film is coated under the waveguide, the incident angle and the waveguide thickness are optimized in order to effectively increase interferential area. This is a key point for research into the Goos-Hanchen shift to optimize the waveguide thickness. Finally, the SPP interferential field is simulated with the finite-difference time-domain (FDTD) technique to prove the optimized results, and indicates that not only is the interferential area enlarged, but the high contrast is also maintained. Furthermore, the mode can fabricate some specific interferential patterns by adding some modulating techniques to the waveguide. So the mode has potential application in the fabrication of sub-wavelength patterns.
引用
收藏
页码:4870 / 4874
页数:5
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