Nonlinear absorption of thin Al2O3 films at 193 nm

被引：26
作者：
Apel, O
Mann, K
Zoeller, A
Goetzelmann, R
Eva, E
机构：
[1] Laser Lab Gottingen eV, D-37077 Gottingen, Germany
[2] Leybold Syst GmbH, D-63450 Hanau, Germany
来源：
APPLIED OPTICS | 2000年 / 39卷 / 18期
关键词：
D O I：
10.1364/AO.39.003165
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Absorption of thin Al2O3 films was measured at 193 nn with an ArF-laser calorimeter. In addition to the expected high linear absorption coefficient, we found, for the first time to our knowledge, that two-photon absorption and transient color-center formation are nonnegligible loss channels in thin films at 193 nm. The nonlinear absorption coefficient is of the order of several times 10(-4) cm/W. (C) 2000 Optical Society of America. OCIS codes: 310.6860, 310.1620, 260.7190.
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收藏
页码：3165 / 3169
页数：5
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