Three-Dimensional Multilayered Nanostructures with Controlled Orientation of Microdomains from Cross-Linkable Block Copolymers

被引:54
作者
Jung, Hyunjung [2 ]
Hwang, Dongjune [2 ]
Kim, Eunhye [1 ]
Kim, Byung-Jae [2 ]
Lee, Won Bo [3 ]
Poelma, Justin E. [4 ,5 ,6 ]
Kim, Jihyun [2 ]
Hawker, Craig J. [4 ,5 ,6 ]
Huh, June [7 ]
Ryu, Du Yeol [1 ]
Bang, Joona [2 ]
机构
[1] Yonsei Univ, Dept Chem & Biomol Engn, Seoul 120749, South Korea
[2] Korea Univ, Dept Chem & Biol Engn, Seoul 136701, South Korea
[3] Sogang Univ, Dept Chem & Biomol Engn, Seoul 121742, South Korea
[4] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
[5] Univ Calif Santa Barbara, Dept Chem & Biochem, Santa Barbara, CA 93106 USA
[6] Univ Calif Santa Barbara, Dept Mat Res Lab, Santa Barbara, CA 93106 USA
[7] Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
关键词
block copolymer thin film; multilayer; 3D nanostructure; light extraction efficiency; GRIN layer; LIGHT-EMITTING-DIODES; PS-B-PMMA; THIN-FILMS; REFRACTIVE-INDEX; LITHOGRAPHY; ENHANCEMENT; SUBSTRATE; ROUTES;
D O I
10.1021/nn2006943
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Three-dimensional (3D) nanostructures were obtained by the directed formation of multilayer block copolymer (BCP) thin films. The initial step in this strategy involves the assembly and cross-linking of cylinder-forming polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) BCP, in which 1.5 mol % of reactive azido (-N-3). groups were randomly incorporated along the styrene backbone. Significantly, assembly of thin films of lamellar-forming BCPs on top of. the underlying cross-linked cylindrical layer exhibited perpendicular orientations of microdomains between. lamellae and cylinder layers. From the theoretical calculation of free energy in the multilayers, it was found that the nematic interactions between polymer chains at the Interface play a critical role in the perpendicular orientation of lamellae on the cross-linked cylinder layers. Removal of the, PMMA domains then affords nonsymmetrical nanostructures which illustrate the promise of this strategy for the design of well-defined 3D nanotemplates. It was also demonstrated that this structure can be effectively used to enhance the light extraction efficiency of GaN light-emitting diodes. Furthermore, we anticipate that such 3D nanotemplates can be applied to various areas, including advanced BCP nanolithography and responsive surface coating.
引用
收藏
页码:6164 / 6173
页数:10
相关论文
共 43 条
[1]   Facile routes to patterned surface neutralization layers for block copolymer lithography [J].
Bang, Joona ;
Bae, Joonwon ;
Lowenhielm, Peter ;
Spiessberger, Christian ;
Given-Beck, Susan A. ;
Russell, Thomas P. ;
Hawker, Craig J. .
ADVANCED MATERIALS, 2007, 19 (24) :4552-+
[2]   Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns [J].
Bang, Joona ;
Jeong, Unyong ;
Ryu, Du Yeol ;
Russell, Thomas P. ;
Hawker, Craig J. .
ADVANCED MATERIALS, 2009, 21 (47) :4769-4792
[3]   Polymer self assembly in semiconductor microelectronics [J].
Black, C. T. ;
Ruiz, R. ;
Breyta, G. ;
Cheng, J. Y. ;
Colburn, M. E. ;
Guarini, K. W. ;
Kim, H.-C. ;
Zhang, Y. .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 2007, 51 (05) :605-633
[4]   Density perturbations in polymers near a solid substrate: An X-ray reflectivity study [J].
Bollinne, C ;
Stone, VW ;
Carlier, V ;
Jonas, AM .
MACROMOLECULES, 1999, 32 (14) :4719-4724
[5]   Lamellar diblock copolymer thin films investigated by tapping mode atomic force microscopy:: Molar-mass dependence of surface ordering [J].
Busch, P ;
Posselt, D ;
Smilgies, DM ;
Rheinländer, B ;
Kremer, F ;
Papadakis, CM .
MACROMOLECULES, 2003, 36 (23) :8717-8727
[6]   Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers [J].
Cheng, Joy Y. ;
Rettner, Charles T. ;
Sanders, Daniel P. ;
Kim, Ho-Cheol ;
Hinsberg, William D. .
ADVANCED MATERIALS, 2008, 20 (16) :3155-3158
[7]   Templated self-assembly of block copolymers: Top-down helps bottom-up [J].
Cheng, Joy Y. ;
Ross, Caroline A. ;
Smith, Henry I. ;
Thomas, Edwin L. .
ADVANCED MATERIALS, 2006, 18 (19) :2505-2521
[8]   Fabrication of complex three-dimensional nanostructures from self-assembling block copolymer materials on two-dimensional chemically patterned templates with mismatched symmetry -: art. no. 036104 [J].
Daoulas, KC ;
Müller, M ;
Stoykovich, MP ;
Park, SM ;
Papakonstantopoulos, YJ ;
de Pablo, JJ ;
Nealey, PF ;
Solak, HH .
PHYSICAL REVIEW LETTERS, 2006, 96 (03)
[9]   Covalent stabilization of nanostructures: Robust block copolymer templates from novel thermoreactive systems [J].
Drockenmuller, E ;
Li, LYT ;
Ryu, DY ;
Harth, E ;
Russell, TP ;
Kim, HC ;
Hawker, CJ .
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 2005, 43 (05) :1028-1037
[10]   Precise control over molecular dimensions of block-copolymer domains using the interfacial energy of chemically nanopatterned substrates [J].
Edwards, EW ;
Montague, MF ;
Solak, HH ;
Hawker, CJ ;
Nealey, PF .
ADVANCED MATERIALS, 2004, 16 (15) :1315-+