Static Random Access Memory Characteristics of Single-Gated Feedback Field-Effect Transistors

被引:31
作者
Cho, Jinsun [1 ]
Lim, Doohyeok [2 ]
Woo, Sola [2 ]
Cho, Kyungah [2 ]
Kim, Sangsig [1 ,2 ]
机构
[1] Korea Univ, Dept Semicond Syst Engn, Seoul 02841, South Korea
[2] Korea Univ, Dept Elect Engn, Seoul 02841, South Korea
基金
新加坡国家研究基金会;
关键词
Feedback field-effect transistors (FBFETs); positive feedback loop; static random access memory (SRAM); transient simulation; LOW-POWER;
D O I
10.1109/TED.2018.2881965
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, we propose a novel static random access memory (SRAM) unit cell design and its array structure consisting of single-gated feedback field-effect transistors (FBFETs). To verify the SRAM characteristics, the basic memory operations and write disturbances of the unit cell are investigated through the mixed-mode technology computer-aided design simulations. The unit cell exhibits the superior SRAM characteristics including a write speed of 0.6 ns, a fast read-out speed of similar to 0.1 ns, and a retention time of 3600 s. Furthermore, the unit cell design exhibits advantages in density, with a small cell area of 8F(2), and in the power consumption; the standby power consumption is 0.24 nW/bit for holding "1" and negligible for holding "0." Moreover, our SRAM array shows reliable 3 x 3 array operations without any disturbances. This paper demonstrates the promising potential of the FBFET SRAM for high-performance, high-density, and low-power memory applications.
引用
收藏
页码:413 / 419
页数:7
相关论文
共 27 条
[1]  
[Anonymous], IEDM
[2]  
[Anonymous], 2016, ATL US MAN
[3]  
[Anonymous], IEDM
[4]   SOI FED-SRAM Cell: Structure and Operation [J].
Badwan, Ahmad Z. ;
Chbili, Zakariae ;
Li, Qiliang ;
Ioannou, Dimitris E. .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2015, 62 (09) :2865-2870
[5]   Memory controller policies for DRAM power management [J].
Fan, XB ;
Ellis, CS ;
Lebeck, AR .
ISLPED'01: PROCEEDINGS OF THE 2001 INTERNATIONAL SYMPOSIUM ON LOWPOWER ELECTRONICS AND DESIGN, 2001, :129-134
[6]   CARRIER RECOMBINATION AND LIFETIME IN HIGHLY DOPED SILICON [J].
FOSSUM, JG ;
MERTENS, RP ;
LEE, DS ;
NIJS, JF .
SOLID-STATE ELECTRONICS, 1983, 26 (06) :569-576
[7]   Device scaling limits of Si MOSFETs and their application dependencies [J].
Frank, DJ ;
Dennard, RH ;
Nowak, E ;
Solomon, PM ;
Taur, Y ;
Wong, HSP .
PROCEEDINGS OF THE IEEE, 2001, 89 (03) :259-288
[8]   Internet of Things (IoT): A vision, architectural elements, and future directions [J].
Gubbi, Jayavardhana ;
Buyya, Rajkumar ;
Marusic, Slaven ;
Palaniswami, Marimuthu .
FUTURE GENERATION COMPUTER SYSTEMS-THE INTERNATIONAL JOURNAL OF ESCIENCE, 2013, 29 (07) :1645-1660
[9]   Silicon CMOS devices beyond scaling [J].
Haensch, W. ;
Nowak, E. J. ;
Dennard, R. H. ;
Solomon, P. M. ;
Bryant, A. ;
Dokumaci, O. H. ;
Kumar, A. ;
Wang, X. ;
Johnson, J. B. ;
Fischetti, M. V. .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 2006, 50 (4-5) :339-361
[10]  
Hong S, 2010, INT EL DEVICES MEET