Approaching the resolution limit of nanometer-scale electron beam-induced deposition

被引：230
作者：
van Dorp, WF
van Someren, B
Hagen, CW
Kruit, P
Crozier, PA
机构：
[1] Delft Univ Technol, Fac Sci Appl, NL-2628 CJ Delft, Netherlands
[2] Arizona State Univ, Ctr Solid State Sci, Tempe, AZ 85287 USA
来源：
NANO LETTERS | 2005年 / 5卷 / 07期
关键词：
D O I：
10.1021/nl050522i
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
We report the writing of very high resolution tungsten containing dots in regular arrays by electron beam-induced deposition (EBID). The size averaged over 100 dots was 1.0 nm at fwhm. Because of the statistical spread in the dot size, large and small dots are present in the arrays, with the smallest having a diameter of only 0.7 nm at fwhm. To date these are the smallest features fabricated by EBID. We have also fabricated lines with the smallest having a width at fwhm of 1.9 nm and a spacing of 3.2 nm.
引用
收藏
页码：1303 / 1307
页数：5
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