Blistering behavior in Mo/Si multilayers

被引：7

作者：

Kuznetsov, A. S. ^{[1
]}

Gleeson, M. A. ^{[1
]}

van de Kruijs, R. W. E. ^{[1
]}

Bijkerk, F. ^{[1
]}

机构：

[1] EURATOM, FOM, Inst Plasma Phys Rijnhuizen, NL-3430 BE Nieuwegein, Netherlands

来源：

DAMAGE TO VUV, EUV, AND X-RAY OPTICS III | 2011年 / 8077卷

关键词：

EUV lithography; hydrogen; blistering; Mo/Si multilayers;

D O I：

10.1117/12.887326

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

This paper is concerned with mapping the characteristics of blistering induced on Mo/Si multilayers as a result of irradiation by hydrogen species generated in a thermal capillary cracker. The nature and extent of the damage observed is dependent on exposure conditions such as the sample temperature, the hydrogen isotope used and the total fluence. Increasing the sample temperature leads to fewer but larger blisters. When D-2 is used as the working gas, blisters are similar to 5 times smaller in diameter than in the case of H-2 exposure, but more blisters are formed. Increasing the gas flow induces more and bigger blisters and blisters were observed to develop in two distinct size distributions.

引用

页数：8

共 18 条

[1]

Allain J.P., 2007, P SOC PHOTO-OPT INS, V6586

[2] Thermally induced decomposition of B4C barrier layers in Mo/Si multilayer structures [J].

Bruijn, S. ;

van de Kruijs, R. W. E. ;

Yakshin, A. E. ;

Zoethout, E. ;

Bijkerk, F. .

SURFACE & COATINGS TECHNOLOGY, 2010, 205 (07) :2469-2473

[3] Enhanced diffusion upon amorphous-to-nanocrystalline phase transition in Mo/B4C/Si layered systems [J].

de Rooij-Lohmann, V. I. T. A. ;

Yakshin, A. E. ;

van de Kruijs, R. W. E. ;

Zoethout, E. ;

Kleyn, A. W. ;

Keim, E. G. ;

Gorgoi, M. ;

Schaefers, F. ;

Brongersma, H. H. ;

Bijkerk, F. .

JOURNAL OF APPLIED PHYSICS, 2010, 108 (01)

[4] Hydrogen blistering of silicon: Effect of implantation temperature, isotope dependence, and key role of dynamic annealing [J].

Giguere, Alexandre ;

Terreault, Bernard .

JOURNAL OF APPLIED PHYSICS, 2007, 102 (10)

[5] Systematics of the giant isotope effect in hydrogen ion blistering of materials [J].

Giguere, Alexandre ;

Terreault, Bernard .

SURFACE & COATINGS TECHNOLOGY, 2007, 201 (19-20) :8205-8209

[6] Gas-phase study of the reactivity of optical coating materials with hydrocarbons by use of a desktop-size extreme-ultraviolet laser [J].

Heinbuch, Scott ;

Dong, Feng ;

Rocca, Jorge J. ;

Bernstein, Elliot R. .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 2008, 25 (07) :B85-B91

[7] Modeling extreme ultraviolet H2O oxidation of ruthenium optic coatings [J].

Hollenshead, J ;

Klebanoff, L .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (01) :118-130

[8] Modeling radiation-induced carbon contamination of extreme ultraviolet optics [J].

Hollenshead, J ;

Klebanoff, L .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (01) :64-82

[9] Debris mitigation and cleaning strategies for Sn-based sources for EUV lithography [J].

Klunder, DJW ;

van Herpen, MMJW ;

Banine, VY ;

Gielissen, K .

Emerging Lithographic Technologies IX, Pts 1 and 2, 2005, 5751 :943-951

[10] Hydrogen interaction with EUVL-relevant optical materials [J].

Kuznetsov, A. S. ;

van de Kruijs, R. W. E. ;

Gleeson, M. A. ;

Schmid, K. ;

Bijkerk, F. .

JOURNAL OF SURFACE INVESTIGATION-X-RAY SYNCHROTRON AND NEUTRON TECHNIQUES, 2010, 4 (04) :563-566

← 1 2 →