Atomistic modeling of step formation and step bunching at the Ge(105) surface

被引:17
作者
Cereda, S
Montalenti, F
Miglio, L
机构
[1] INFM, I-20125 Milan, Italy
[2] Univ Studi Milano Bicocca, Dipartimento Sci Mat, LNESS, I-20125 Milan, Italy
关键词
Ge/Si(001); (105)Ge surface; step formation and bunching; dot facets; molecular dynamics; empirical calculations;
D O I
10.1016/j.susc.2005.06.016
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We investigate possible step geometries on the rebonded-step reconstructed Ge(105) surface. We focus our attention on steps oriented along the [010] direction, which have been shown to play a key role in the pyramid-to-dome transition during Ge growth on Si(001). Using molecular dynamics simulations based on the Tersoff potential, we evaluate the step formation energy for several alternative structures. The step-bunching process is also analyzed, showing that one monolayer-high steps are likely to group into multistepped structures. Our results provide support for very recent experiments and modeling on the pyramid-to-dome transition in Ge/Si(001). (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:23 / 31
页数:9
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