A quality concept for impurities during drug development - use of the hyphenated LC-MS technique

被引:12
作者
Ermer, J [1 ]
Kibat, PG [1 ]
机构
[1] Hoechst Marion Roussel Germany, Global Pharmaceut, Dev Analyt, D-65926 Frankfurt, Germany
来源
PHARMACEUTICAL SCIENCE & TECHNOLOGY TODAY | 1998年 / 1卷 / 02期
关键词
D O I
10.1016/S1461-5347(98)00025-X
中图分类号
R9 [药学];
学科分类号
1007 ;
摘要
A quality concept for impurities during the drug development process is proposed based on the requirements featured in the impurity guidelines of the International Conference on Harmonisation. Because of the particular nature of the drug development process, one crucial element is qualification. Once an impurity profile is qualified by the first toxicological studies, attention is then focused on the comparison made, by means of comprehensive analytical monitoring, between qualified impurities and those of new batches. The clear assignment of impurities to toxicologically-qualified impurities can be addressed using multidimensional information, such as retention times, molecular mass or spectral properties. The advantages of use of the hyphenated LC-MS technique in performing this 'impurity inventory' are discussed by the authors using the example of peptide drugs.
引用
收藏
页码:76 / 82
页数:7
相关论文
共 7 条
[1]   A review of the current status of capillary electrochromatography technology and applications [J].
Altria, KD ;
Smith, NW ;
Turnbull, CH .
CHROMATOGRAPHIA, 1997, 46 (11-12) :664-674
[2]   HPLC SEPARATION OF DL-AMINO ACIDS DERIVATIZED WITH N2-(5-FLUORO-2,4-DINITROPHENYL)-L-AMINO ACID-AMIDES [J].
BRUCKNER, H ;
KELLERHOEHL, C .
CHROMATOGRAPHIA, 1990, 30 (11-12) :621-629
[3]   Capillary electrochromatography [J].
Colon, LA ;
Guo, Y ;
Fermier, A .
ANALYTICAL CHEMISTRY, 1997, 69 (15) :A461-A467
[4]  
ERMER J, 1997, REGULATORY AFFAIRS J, V8, P722
[5]  
*ICH, 1997, Q3B IMP NEW DRUG PRO
[6]  
*ICH, 1997, Q3C IMP RES SOLV
[7]  
International Conference on Harmonisation of Technical Requirements for Registration of Pharmaceuticals for Human Use (ICH) Q6A, 1995, INT C HARM TECHN REQ