Carrier lifetime measurements using free carrier absorption transients. I. Principle and injection dependence

被引:112
作者
Linnros, J [1 ]
机构
[1] Royal Inst Technol, Dept Elect, S-16440 Kista, Sweden
关键词
D O I
10.1063/1.368024
中图分类号
O59 [应用物理学];
学科分类号
摘要
A contactless, all-optical technique for semiconductor charge carrier lifetime characterization is reviewed. The technique is based upon measurements of free carrier absorption transients by an infrared probe beam following electron-hole pair excitation by a pulsed laser beam. Main features are a direct probing of the excess carrier density coupled with a homogeneous carrier distribution within the sample, enabling precision studies of different recombination mechanisms. We show that the method is capable of measuring the lifetime over a broad range of injections (10(13)-10(18) cm(-3)) probing both the minority carrier lifetime, the high injection lifetime and Auger recombination, as well as the transition between these ranges. Performance and limitations of the technique, such as lateral resolution, are addressed while application of the technique for lifetime mapping and effects of surface recombination is outlined in a companion article [J. Appl. Phys. 84, 284 (1998), part IT]. Results from detailed studies of the injection dependence yield good agreement with the Shockley-Read-Hall theory, whereas the coefficient for Auger recombination shows an apparent shift to a higher value, with respect to the traditionally accepted value, at carrier densities below similar to 2-5 X 10(17) cm(-3). Data also indicate an increased value of the coefficient for bimolecular recombination (radiative or trap-assisted Auger) from the generally accepted value. Measurements on an electron irradiated wafer and wafers of exceptionally high carrier lifetimes are also discussed within the framework; of different recombination mechanisms. (C) 1998 American Institute of Physics.
引用
收藏
页码:275 / 283
页数:9
相关论文
共 37 条
[11]  
GRIVICKAS V, 1996, P 23 INT C PHYS SEM, V1, P91
[12]   INTRINSIC UPPER LIMITS OF THE CARRIER LIFETIME IN SILICON [J].
HACKER, R ;
HANGLEITER, A .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (11) :7570-7572
[13]   ELECTRON-HOLE RECOMBINATION IN GERMANIUM [J].
HALL, RN .
PHYSICAL REVIEW, 1952, 87 (02) :387-387
[14]   Lifetime in proton irradiated silicon [J].
Hallen, A ;
Keskitalo, N ;
Masszi, F ;
Nagl, V .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (08) :3906-3914
[15]   NONRADIATIVE RECOMBINATION VIA DEEP IMPURITY LEVELS IN SILICON - EXPERIMENT [J].
HANGLEITER, A .
PHYSICAL REVIEW B, 1987, 35 (17) :9149-9161
[16]   CONTACTLESS MEASUREMENT OF BULK FREE-CARRIER LIFETIME IN CAST POLYCRYSTALLINE SILICON INGOTS [J].
JOHNSON, SM ;
JOHNSON, LG .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (06) :2008-2015
[17]  
Kane D.E., 1985, PROC 18 IEEE PHOTOVO, P578
[18]   THE EFFECT OF EXCITONS ON APPARENT BAND-GAP NARROWING AND TRANSPORT IN SEMICONDUCTORS [J].
KANE, DE ;
SWANSON, RM .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (03) :1193-1197
[19]   TRAP-AUGER RECOMBINATION IN SILICON OF LOW CARRIER DENSITIES [J].
LANDSBERG, PT .
APPLIED PHYSICS LETTERS, 1987, 50 (12) :745-747
[20]   LIFETIME MEASUREMENTS IN SEMICONDUCTORS BY INFRARED-ABSORPTION DUE TO PULSED OPTICAL-EXCITATION [J].
LING, ZG ;
AJMERA, PK ;
ANSELMENT, M ;
DIMAURO, LF .
APPLIED PHYSICS LETTERS, 1987, 51 (18) :1445-1447