Effect of chemical activity of bulk and pad materials on the redeposition layer during polishing of glass

被引：4

作者：

Cai, Chao ^{[1
]}

Liu, Yunxia ^{[2
]}

He, Xiang ^{[1
]}

Zhao, Heng ^{[1
]}

Wang, Gang ^{[1
]}

Huang, Jinyong ^{[1
]}

Hu, Qing ^{[1
]}

Xie, Lei ^{[1
]}

Ma, Ping ^{[1
]}

Yan, Dingyao ^{[1
]}

Yin, Liangjun ^{[2
]}

机构：

[1] Chengdu Fine Opt Engn Res Ctr, Chengdu 610041, Peoples R China

[2] Univ Elect Sci & Technol China, Sch Mat & Energy, 2006 Xiyuan Rd, Chengdu 611731, Peoples R China

来源：

THIN SOLID FILMS | 2021年 / 735卷 / 735期

关键词：

chemical-mechanical polishing; silicate glass; redeposition layer; surface roughness; LASER-INDUCED DAMAGE; FUSED-SILICA OPTICS; INDUCED CONTAMINATION; PERFORMANCE;

D O I：

10.1016/j.tsf.2021.138876

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A near-surface redeposition layer is formed in the chemical mechanical polishing process of silicate glasses. In this work, secondary ion mass spectroscopy analyzer and transmission electron microscope are used to inves-tigate the effect of bulk and pad materials on the microstructure and contaminations of the redeposition layer. The results suggest that the polishing materials with higher chemical reactivity will generate a deeper redepo-sition layer with higher concentration of contaminant elements, which will improve the surface quality by mitigating the mechanical abrasion effect. Then, a more detailed chemical mechanism of the redeposition layer formation has been concluded according to the chemical reaction and arrhenius equation, which can explain the effect of bulk materials and polishing pad on the redeposition layer well. These findings are helpful to understand the chemical process of polishing and improve the lifetime and quality of optical components especially in UV or high-power laser systems.

引用

页数：7

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