Effect of cooling system design on the heat dissipation of the magnetron sensitive components with rectangular target during sputtering by Ar+

被引:3
作者
Omar, Ali Ayachi [1 ]
Kashapov, Nail Faikovich [1 ,2 ]
Luchkin, Alexander Grigoryvich [1 ]
Amor, Asma Ayachi [3 ]
Amar, Abdelouahed Ayachi [4 ]
机构
[1] Kazan Volga Fed Univ, Kazan 420008, Russia
[2] RAS, Joint Inst High Temp, Moscow 125412, Russia
[3] Kasdi Merbah Univ Ouargla, Ouragla 30000, Algeria
[4] Hassiba Ben Bouali Univ Chlef, Chlef 02000, Algeria
基金
俄罗斯科学基金会;
关键词
Magnetron; Monte Carlo simulation; Computational fluid dynamics; Curie-temperature; Heat dissipation; Cooling system; TRANSPORT; TURBULENT; MODEL;
D O I
10.1016/j.rineng.2022.100696
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The temperature of the magnetron-sensitive components should be kept below the threshold limit during sputtering. Overheating over the Curie-temperature of the magnets can occur if the heat generated in the magnetron is not sufficiently dissipated, causing the collapse of the entire sputtering process can occur. To ensure proper dissipation of the heat generated in the magnetron and understand the process, we proposed 3D model, through which we were able to model the process and determine the heat source on the surface of the target using Monte Carlo simulation. With the target being a heat source in the magnetron, using Computational fluid dynamics model with Fourier's-law, we simulated the heat transfer inside a magnetron and validated the simulation results by measuring the temperature using a thermal camera. Then we analyzed the heat fluxes and heat exchange with different cooling-water paths, and we explained their effect on the heat transfer inside a magnetron. The results indicate that according to the calculation criteria, an appropriate design must be selected that ensures that the cooling-water reaches the heat source to maximize heat dissipation and keep the temper-ature below the Curie-temperature level of the magnets. Engineers and researchers can use this model to opti-mize process efficiency and explore new designs, while at the same time reducing the need for costly experimental trials.
引用
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页数:11
相关论文
共 36 条
  • [1] Baik JS, 2007, PROCEEDINGS OF THE ASME/JSME THERMAL ENGINEERING SUMMER HEAT TRANSFER CONFERENCE 2007, VOL 1, P315
  • [2] Calculation of the effective gas interaction probabilities of the secondary electrons in a dc magnetron discharge
    Buyle, G
    Depla, D
    Eufinger, K
    De Gryse, R
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2004, 37 (12) : 1639 - 1647
  • [3] Effect of the target temperature during magnetron sputtering of Nickel
    Caillard, A.
    El'Mokh, M.
    Lecas, T.
    Thomann, A. -L.
    [J]. VACUUM, 2018, 147 : 82 - 91
  • [4] Calin MD, 2011, INT SYMP ADV TOP
  • [5] MELTING-POINT, NORMAL SPECTRAL EMITTANCE (AT MELTING-POINT), AND ELECTRICAL-RESISTIVITY (ABOVE 1900-K) OF TITANIUM BY A PULSE HEATING METHOD
    CEZAIRLIYAN, A
    MIILLER, AP
    [J]. JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1977, 82 (02): : 119 - 122
  • [6] Chapin J.S., 1979, Sputtering process and apparatus
  • [7] Effect of temperature and deposition technology on the microstructure, chemistry and tribo-mechanical characteristics of Ti-B based thin films by magnetron sputtering
    Deambrosis, Silvia Maria
    Zin, Valentina
    Montagner, Francesco
    Mortal, Cecilia
    Fabrizio, Monica
    Miorin, Enrico
    [J]. SURFACE & COATINGS TECHNOLOGY, 2021, 405
  • [8] Magnetic dome configuration for magnetron sputtering
    Ejima, S
    Shimizu, Y
    [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 2001, 72 (05) : 2374 - 2379
  • [9] Experimental and numerical analysis of holistic active and passive thermal management systems for electric vehicles: Fast charge and discharge applications
    Karimi, Danial
    Behi, Hamidreza
    Van Mierlo, Joeri
    Berecibar, Maitane
    [J]. RESULTS IN ENGINEERING, 2022, 15
  • [10] Magnetron sputtering: a review of recent developments and applications
    Kelly, PJ
    Arnell, RD
    [J]. VACUUM, 2000, 56 (03) : 159 - 172