Zirconium oxide films deposited by reactive pulsed laser ablation

被引：6
作者：
Flamini, C
Guidoni, AG
Teghil, R
Marotta, V
机构：
[1] Univ Rome La Sapienza, Dipartimento Chim, I-00185 Rome, Italy
[2] Univ Basilicata, Dipartimento Chim, I-85100 Potenza, Italy
[3] CNR, Ist Mat Speciali, I-85050 Tito Scalo, PZ, Italy
来源：
APPLIED SURFACE SCIENCE | 1999年 / 138卷
关键词：
laser; ablation; deposition; thin film; zirconium oxide;
D O I：
10.1016/S0169-4332(98)00502-9
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
(L)aser ablation, by Kr-F and Nd-YAG lasers, of solid targets of ZrO2 has been studied in vacuum and in oxygen atmosphere. The plume expansion and composition have been characterized by mass spectrometric and optical techniques. Cluster ions Zr,OY and neutral species, formed in the plasma, have been identified by mass spectrometry. Plume velocity has been measured by a ICCD camera. Buffer gas effects and geometrical parameters have been optimized to improve the quality of the deposited thin films. (C) 1999 Published by Elsevier Science B.V. All lights reserved.
引用
收藏
页码：344 / 349
页数：6
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