Computational analysis of heat transfer, thermal stress and dislocation density during resistively Czochralski growth of germanium single crystal

被引:9
作者
Tavakoli, Mohammad Hossein [1 ]
Renani, Elahe Kabiri [1 ]
Honarmandnia, Mohtaram [1 ]
Ezheiyan, Mahdi [2 ]
机构
[1] Bu Ali Sina Univ, Phys Dept, Hamadan 65174, Iran
[2] Malek Ashtar Univ, Faqulty Phys, Shahin Shahr, Iran
关键词
Computer simulation; Heat transfer; Fliud flows; Czochralski method; Semiconducting germanium; DYNAMIC GLOBAL SIMULATION; FLUID-FLOW; TRANSPORT; SILICON; MELT;
D O I
10.1016/j.jcrysgro.2017.11.021
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
In this paper, a set of numerical simulations of fluid flow, temperature gradient, thermal stress and dislocation density for a Czochralski setup used to grow IR optical-grade Ge single crystal have been done for different stages of the growth process. A two-dimensional steady state finite element method has been applied for all calculations. The obtained numerical results reveal that the thermal field, thermal stress and dislocation structure are mainly dependent on the crystal height, heat radiation and gas flow in the growth system. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:125 / 133
页数:9
相关论文
共 28 条
[2]   SINGLE CRYSTALS OF EXCEPTIONAL PERFECTION AND UNIFORMITY BY ZONE LEVELING [J].
BENNETT, DC ;
SAWYER, B .
BELL SYSTEM TECHNICAL JOURNAL, 1956, 35 (03) :637-660
[3]  
Bergman T.L., 2011, Introduction to Heat Transfer, DOI DOI 10.1016/J.APPLTHERMALENG.2011.03.022
[5]   Features of mass transfer for the laminar melt flow along the interface [J].
Bykova, SV ;
Golyshev, VD ;
Gonik, MA ;
Tsvetovsky, VB ;
Frjazinov, IV ;
Marchenko, MP .
JOURNAL OF CRYSTAL GROWTH, 2002, 237 (1-4 III) :1886-1891
[6]  
Claeys C., 2007, Germanium-based technologies: from materials to devices
[7]   MATHEMATICAL-MODELING OF HEAT-FLOW IN CZOCHRALSKI CRYSTAL PULLING [J].
CROWLEY, AB .
IMA JOURNAL OF APPLIED MATHEMATICS, 1983, 30 (02) :173-189
[8]  
Depuydt B., 2011, GERMANIUM SINGLE CRY
[9]  
Depuydt B., 1997, SPIE P, P559
[10]   Germanium: From the first application of Czochralski crystal growth to large diameter dislocation-free wafers [J].
Depuydt, Ben ;
Theuws, Antoon ;
Romandic, Igor .
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2006, 9 (4-5) :437-443