A route to nanoscopic SiO2 posts via block copolymer templates

被引：0
|
作者：
Kim, HC
Jia, XQ
Stafford, CM
Kim, DH
McCarthy, TJ
Tuominen, M
Hawker, CJ
Russell, TP
机构：
[1] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA
[2] Univ Massachusetts, Dept Phys, Amherst, MA 01003 USA
[3] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
来源：
ADVANCED MATERIALS | 2001年 / 13卷 / 11期
关键词：
D O I：
10.1002/1521-4095(200106)13:11<795::AID-ADMA795>3.0.CO;2-1
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
A surface covered with a nanopatterned, regularly spaced array of SiO2 blocks is obtained by coating silica with a block copolymer, selectively removing one polymer from the layer, depositing SiO2 in the voids, and finally degrading the second polymer. The Figure shows an AFM image of a finished sample. Rough surfaces of this type are very promising candidates for sensor and lab-on-a-chip applications.
引用
收藏
页码：795 / +
页数：4
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