Efficient Mode-Locking of Sub-70-fs Ti: Sapphire Laser by Graphene Saturable Absorber

被引：138
作者：
Baek, In Hyung [1 ,2 ]
Lee, Hwang Woon [1 ,2 ]
Bae, Sukang [3 ]
Hong, Byung Hee [3 ]
Ahn, Yeong Hwan [1 ,2 ]
Yeom, Dong-Il [1 ,2 ]
Rotermund, Fabian [1 ,2 ]
机构：
[1] Ajou Univ, Dept Phys, Suwon 443749, Gyeonggi, South Korea
[2] Ajou Univ, Div Energy Syst Res, Suwon 443749, Gyeonggi, South Korea
[3] Seoul Natl Univ, Dept Chem, Seoul 151747, South Korea
来源：
APPLIED PHYSICS EXPRESS | 2012年 / 5卷 / 03期
基金：
新加坡国家研究基金会;
关键词：
MU-M; BULK LASER; PULSES;
D O I：
10.1143/APEX.5.032701
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The efficient passive mode-locking of a Ti: sapphire laser with a monolayer graphene saturable absorber is demonstrated for the first time. High-quality and large-area (1 in.) monolayer graphene, synthesized by chemical vapor deposition, exhibits ultrafast recovery times and excellent nonlinear absorption behavior for bulk solid-state laser mode-locking near 800 nm. The continuous-wave mode-locked Ti: sapphire laser generates 63-fs pulses with output powers up to 480 mW under stable operation at 99.4 MHz. (c) 2012 The Japan Society of Applied Physics
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页数：3
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