The critical role of solvent evaporation on the roughness of spin-cast polymer films

被引：228

作者：

Strawhecker, KE

Kumar, SK ^{[1
]}

Douglas, JF

Karim, A

机构：

[1] Penn State Univ, Dept Mat Sci & Engn, University Pk, PA 16802 USA

[2] Natl Inst Stand & Technol, Div Polymers, Gaithersburg, MD 20899 USA

来源：

MACROMOLECULES | 2001年 / 34卷 / 14期

关键词：

D O I：

10.1021/ma001440d

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

The critical role of solvent evaporation on the roughness of spin-cast polymer films was studied. Solvent-rich films were demonstrated to possess insufficient time to level and heal surface roughness created by Marangoni instabilities when the solvent was rapidly evaporating. The role of solution leveling was also emphasized by dynamic contact angle measurements. Analysis showed that it was possible to control the surface roughness of dip coated or spin cast films from good solvents by varying the evaporation rate of the solvent.

引用

页码：4669 / 4672

页数：4

共 19 条

[1]

[Anonymous], 1993, PAINTS COATINGS SOLV

[2] SPIN COATING - ONE-DIMENSIONAL MODEL [J].