Patterning of Heteroepitaxial Overlayers from Nano to Micron Scales

被引:59
作者
Elder, K. R. [1 ]
Rossi, G. [2 ,3 ]
Kanerva, P. [2 ,3 ]
Sanches, F. [1 ]
Ying, S-C. [4 ]
Granato, E. [4 ,5 ]
Achim, C. V. [2 ,3 ]
Ala-Nissila, T. [2 ,3 ,4 ]
机构
[1] Oakland Univ, Dept Phys, Rochester, MI 48309 USA
[2] Aalto Univ, Sch Sci, Dept Appl Phys, FI-00076 Espoo, Finland
[3] Aalto Univ, Sch Sci, COMP Ctr Excellence, FI-00076 Espoo, Finland
[4] Brown Univ, Dept Phys, Providence, RI 02912 USA
[5] Inst Nacl Pesquisas Espaciais, Lab Associado Sensores & Mat, BR-12227010 Sao Jose Dos Campos, SP, Brazil
基金
芬兰科学院; 美国国家科学基金会; 巴西圣保罗研究基金会;
关键词
SURFACE; FILMS; RECONSTRUCTION; DISLOCATIONS; ADSORPTION; GRAPHENE; GROWTH; STRAIN;
D O I
10.1103/PhysRevLett.108.226102
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Thin heteroepitaxial overlayers have been proposed as templates to generate stable, self-organized nanostructures at large length scales, with a variety of important technological applications. However, modeling strain-driven self-organization is a formidable challenge due to different length scales involved. In this Letter, we present a method for predicting the patterning of ultrathin films on micron length scales with atomic resolution. We make quantitative predictions for the type of superstructures (stripes, honeycomb, triangular) and length scale of pattern formation of two metal-metal systems, Cu on Ru(0001) and Cu on Pd(111). Our findings are in excellent agreement with previous experiments and call for future experimental investigations of such systems.
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页数:5
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