Crystal growth of large-diameter bulk CdTe on GaAs wafer seed plates

被引:13
作者
Mullins, J. T. [2 ]
Cantwell, B. J. [2 ]
Basu, A. [2 ]
Jiang, Q. [1 ]
Choubey, A. [1 ]
Brinkman, A. W. [1 ]
机构
[1] Univ Durham, Dept Phys, Durham DH1 3LE, England
[2] Durham Sci Crystals Ltd, Durham TS21 3FD, England
基金
英国工程与自然科学研究理事会;
关键词
X-ray diffraction; growth from vapour; physical vapour deposition process; semiconductor II-VI materials;
D O I
10.1016/j.jcrysgro.2007.11.190
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We report here on some of the characteristics of CdTe bulk crystals grown on commercially available (211)B GaAs wafers by multitube physical vapour transport, a process analogous to vapour phase heteroepitaxy. Crystals several millimetres in thickness have been grown on 50 mm diameter seed plates with growth rates similar to 120 mu m/h. Double- and triple-axis X-ray diffraction gave resolution-limited FWHM values of 34 arcsec. Maps across an as-grown surface showed the FWHM to be less than similar to 80 arcsec over the majority of the surface. Infrared microscopy revealed there were comparatively low levels of Te inclusions in the central part of the crystal, but rather higher concentrations towards the edges. The use of GaAs substrates did not appear to produce the compensated material, and it was necessary to dope the material with Cl to render it semi-insulating. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:2058 / 2061
页数:4
相关论文
共 10 条