High Concentration Substitutional N-Doped TiO2 Film: Preparation, Characterization, and Photocatalytic Property

被引：46

作者：

Jiang, Xudong ^{[1
,2
]}

Wang, Yongqian ^{[1
,2
,3
]}

Pan, Chunxu ^{[1
,2
]}

机构：

[1] Wuhan Univ, Minist Educ, Sch Phys & Technol, Wuhan 430072, Peoples R China

[2] Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanostruct, Wuhan 430072, Peoples R China

[3] China Univ Geosci, Minist Educ, Engn Res Ctr Nanogeomat, Wuhan 430074, Peoples R China

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 2011年 / 94卷 / 11期

关键词：

PHOTO-CATALYTIC ACTIVITY; TITANIUM-OXIDE; DISINFECTION;

D O I：

10.1111/j.1551-2916.2011.04692.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

This article introduces a novel and valid process for preparing a high concentration substitutional N-doped TiO2 photocatalytic film, i.e. firstly the titanium substrate was plasma nitrided and then the N-doped TiO2 was synthesized on the surface of nitrided titanium by using micro-arc oxidation. Compared with the traditional thermal annealing, the present process provides a possibility to increase the nitrogen doping concentration up to 3.21 at.% and x to 0.11 in TiO2-xNx, which exhibits a significant red-shift in the band-gap transition, narrow band gap to 2.6 eV, higher photo-generated charge carrier density and improved photocatalytic property.

引用

页码：4078 / 4083

页数：6

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