Submicron trackwidth and stripe height MR sensor test structures

Magnetic recording areal densities greater than 5 Gbit/in(2) will require magnetoresistive (MR) sensors with critical dimensions below 1.0 mu m. The longitudinal bias scheme used for this sensor size must provide stable device operation and must be compatible with fine dimension lithographic processing. A contiguous junction sensor structure with longitudinal material abutted to the sensor magnetic films and with lead material self aligned to the longitudinal bias material can satisfy these requirements. This is demonstrated by the fabrication and testing of submicron unshielded MR structures with stable transfer curves.