Grain orientation measurement of passivated aluminum interconnects by X-ray micro diffraction

被引：0

作者：

Chang, CH ^{[1
]}

Valek, BC ^{[1
]}

Padmore, HA ^{[1
]}

MacDowell, AA ^{[1
]}

Celestre, R ^{[1
]}

Marieb, T ^{[1
]}

Bravman, JC ^{[1
]}

Koo, YM ^{[1
]}

Patel, JR ^{[1
]}

机构：

[1] Res Inst Ind Sci & Technol, Pohang 790600, South Korea

来源：

X-RAY MICROSCOPY, PROCEEDINGS | 2000年 / 507卷

关键词：

D O I：

暂无

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The crystallographic orientations of individual grains in a passivated aluminum interconnect line of 0.7-mum width were investigated by using an incident white x-ray microbeam at the Advanced Light Source, Berkeley National Laboratory. Intergrain orientation mapping was obtained with about 0.05degrees sensitivity by the micro Laue diffraction technique.

引用

页码：284 / 287

页数：4

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