Temperature dependence of energy gap in GaN thin film studied by thermomodulation

被引:31
作者
Li, Y
Lu, Y
Shen, H
Wraback, M
Brown, MG
Schurman, M
Koszi, L
Stall, RA
机构
[1] RUTGERS STATE UNIV,DEPT ELECT & COMP ENGN,PISCATAWAY,NJ 08855
[2] USA,RES LAB,PHYS SCI DIRECTORATE,AMSRL PS PB,FT MONMOUTH,NJ 07703
关键词
D O I
10.1063/1.118855
中图分类号
O59 [应用物理学];
学科分类号
摘要
The thermomodulation spectrum from metal organic chemical vapor deposition grown GaN has been measured in the temperature range of 20-310 K. A theoretical model is established to explain the spectrum by considering the modulation of dielectric constant and epilayer thickness. It is found that the latter is especially important for a material system with a large difference in refractive indices between the epilayer and the substrate. The band gap energy and broadening parameter are determined using a lineshape analysis. Varshni coefficients of the energy gap are determined. The temperature dependence of broadening parameter is also measured. (C) 1997 American Institute of Physics.
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页码:2458 / 2460
页数:3
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