High-speed hydrophilic and ashing treatments of polyimide using Ar/O2 atmospheric-pressure microwave line plasma

被引：3

作者：

Suzuki, H. ^{[1
,2
]}

Ogasawara, T. ^{[1
]}

Iwata, Y. ^{[1
]}

Bae, H. ^{[1
]}

Toyoda, H. ^{[1
,2
,3
]}

机构：

[1] Nagoya Univ, Dept Elect, Chikusa Ku, Furo Cho, Nagoya, Aichi 4648603, Japan

[2] Nagoya Univ, Ctr Low Temp Plasma Sci, Chikusa Ku, Furo Cho, Nagoya, Aichi 4648603, Japan

[3] Natl Inst Fus Sci, 322-6 Oroshi Cho, Toki, Gifu 5095292, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2022年 / 61卷 / SI期

关键词：

atmospheric-pressure plasma; microwave plasma; surface treatment; wettability control; ashing; VUVAS; ULTRAVIOLET ABSORPTION-SPECTROSCOPY; ABSOLUTE DENSITY-MEASUREMENTS; DIELECTRIC BARRIER DISCHARGE; SURFACE MODIFICATION; GAS TEMPERATURE; GLOW-DISCHARGE; ATOMS; FILMS; JET;

D O I：

10.35848/1347-4065/ac64e2

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The performance of a newly-developed 1D-long atmospheric-pressure microwave plasma, i.e. atmospheric-pressure microwave line plasma (APMLP), is demonstrated. Using vacuum ultraviolet atomic absorption spectroscopy, spatially uniform oxygen radical density along a 50 cm length is observed. With the APMLP using Ar/O-2 gas, very fast hydrophilic treatment of polyimide (PI) film within 20 ms is obtained. Using looped-waveguide-type APMLP, fast ashing treatment of PI film at an ashing rate of 20 mu m min(-1) is demonstrated.

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页数：5

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