Stacking reversal as a source of perpendicular magnetic anisotropy in Ni-Pt multilayers -: art. no. 220405

被引:12
作者
Robach, O
Quirós, C
Isérn, H
Steadman, P
Peters, KF
Ferrer, S
机构
[1] European Synchrotron Radiat Facil, F-38043 Grenoble, France
[2] Univ Leeds, Dept Phys & Astron, Leeds LS2 9JC, W Yorkshire, England
[3] Hewlett Packard Corp, Corvallis, OR 97330 USA
关键词
D O I
10.1103/PhysRevB.67.220405
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Based on surface x-ray diffraction and resonant magnetic surface x-ray diffraction measurements on ultrathin films of Pt on Ni(111) and Ni on Pt(111), we propose a simple explanation for the perpendicular magnetic anisotropy (PMA) observed at room temperature in Ni-Pt multilayers. The stacking sequence of Ni grown on Pt(111) is the same as that of the Pt substrate (normal stacking: ABCABC) whereas that of Pt grown on Ni(111) is reversed (ACBACB). As a consequence the Ni layers in Ni-Pt multilayers alternate between normal and reversed stacking. The [111] direction, which is normal to the interface planes, is invariant under the two types of stacking whereas the other equivalent crystallographic directions are not. This specific symmetry selects the [111] direction as the preferred magnetic easy axis over all the multilayer stack, causing PMA. The influence of the Pt layer thickness on the PMA is also discussed.
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页数:4
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